Semiconductor device

Category: Industry Applications

Release time: 2026-03-30

 

DZB400 cryopump used in the microelectronics industry

The IG250FX and IG320FX cryopumps are used in ion implanters.
The DWB320 cryopump is used in ITO conductive film production lines.

The DWB250 is used in conjunction with a molecular pump on ITO conductive film coating lines.

In the manufacturing process of semiconductor devices, every step—from thin-film deposition and etching to doping and modification—places stringent demands on the vacuum environment and cleanliness. As a core piece of equipment for achieving a clean, high vacuum, cryopumps play an irreplaceable role in critical process stages.

Typical applications of the DZB400 cryopump in the microelectronics industry. This pump is integrated into physical vapor deposition (PVD) or etching equipment, where it efficiently captures water vapor and process byproducts, providing an oil‑free, ultra‑high vacuum environment for wafer processing. This ensures the density of thin‑film growth and the uniformity of etched features, thereby improving device yield.

Specialized application of the IG250 cryopump in ion implanters. Addressing the substantial gas loads—primarily hydrogen and nitrogen—typical of ion‑implantation processes, this pump delivers high pumping speeds and large capacity for stable evacuation, ensuring that the beamline chamber maintains a dynamically high vacuum over extended periods. This enables precise control of the purity of ion‑beam transport, ultimately achieving accurate and controllable doping depth and concentration to meet the demands of advanced device fabrication.

In the semiconductor and flat-panel display industries, particularly in the production of ITO (indium tin oxide) conductive films, water vapor is a critical factor that affects both the film’s electrical conductivity and optical transmittance. In response to the stringent requirements of this process—namely, high vacuum and high pumping speeds—cryotraps and their integrated solutions have been widely adopted.

The DWB320 cryotrap is used in ITO conductive‑film production lines. Designed specifically for processes with high water‑vapor loads, it rapidly evacuates the substantial amounts of water vapor released during substrate degassing and sputtering, providing a stable, clean vacuum environment for ITO film deposition. This effectively reduces the film’s resistivity and enhances both its uniformity and adhesion.

The DWB250 cryotrap, in combination with a molecular pump, is employed on ITO conductive‑film coating lines. This integrated solution leverages the cryotrap’s high pumping speed for water vapor and the molecular pump’s efficient evacuation of most process gases, enabling rapid equilibrium of all gas species within the coating chamber. This significantly reduces cycle time and ensures consistent optoelectronic performance of ITO films during large‑scale, continuous coating processes.

Previous page

Mobile phone industry

Display device

next

More apps

%E7%AC%AC%E4%B8%80%EF%BC%8C%E6%9C%80%EF%BC%8C%E4%BC%98%E7%A7%80%EF%BC%8C%E5%A2%9E%E5%BC%BA%EF%BC%8C%E4%B8%80%E6%B5%81%EF%BC%8C%E5%8D%93%E8%B6%8A%EF%BC%8C%E9%A2%86%E5%85%88%EF%BC%8C%E5%85%88%E8%BF%9B%EF%BC%8C%E5%BC%95%E9%A2%86